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Revolutionary Lithography Process Promises Smaller Semiconductors

9/13/2025

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Summary

Story summary

Researchers from various universities have created a new lithographic process to further reduce semiconductor feature sizes, supporting Moore's Law.
This process employs an imidazole-based resist for B-EUV lithography, outperforming traditional resists.
Michael Tsapatsis from Johns Hopkins University stresses the importance of cost-effective production with accurate irradiation.
The team has demonstrated this method in the lab but has not yet scaled it for commercial use.
Their findings, published in Nature Chemical Engineering, suggest potential for diverse metal-organic pairings in semiconductor manufacturing.

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Story summary

Researchers from various universities have created a new lithographic process to further reduce semiconductor feature sizes, supporting Moore's Law.
This process employs an imidazole-based resist for B-EUV lithography, outperforming traditional resists.
Michael Tsapatsis from Johns Hopkins University stresses the importance of cost-effective production with accurate irradiation.
The team has demonstrated this method in the lab but has not yet scaled it for commercial use.
Their findings, published in Nature Chemical Engineering, suggest potential for diverse metal-organic pairings in semiconductor manufacturing.