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Breakthrough Tech Cuts Lithography Defects by 99%

10/27/2025

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Summary

Story summary

Peking University researchers published in Nature Communications a solution that reduces lithography defects by 99% after using cryo-electron tomography to study photoresist molecules.
The finding is expected to improve defect control and yield in semiconductor manufacturing.
China's photoresist market is projected to exceed 11.4 billion yuan ($1.6 billion) in 2024, signaling a shift toward domestic mid-to-high-end production.

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Story summary

Peking University researchers published in Nature Communications a solution that reduces lithography defects by 99% after using cryo-electron tomography to study photoresist molecules.
The finding is expected to improve defect control and yield in semiconductor manufacturing.
China's photoresist market is projected to exceed 11.4 billion yuan ($1.6 billion) in 2024, signaling a shift toward domestic mid-to-high-end production.