Story perspectives

China's EUV Prototype Sparks Semiconductor Production Ambitions by 2028

12/18/2025

Summary

Story summary

Chinese scientists in Shenzhen, including former ASML Holding N.V. engineers, have built a prototype extreme ultraviolet lithography machine.
The prototype currently generates the ultraviolet light needed for EUV processes but has not produced any chips.
China aims to begin EUV chip production by 2028, though experts say 2030 is more realistic.
The prototype’s existence suggests China may advance faster in semiconductor technology, despite relying on older ASML components.

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Story summary

Chinese scientists in Shenzhen, including former ASML Holding N.V. engineers, have built a prototype extreme ultraviolet lithography machine.
The prototype currently generates the ultraviolet light needed for EUV processes but has not produced any chips.
China aims to begin EUV chip production by 2028, though experts say 2030 is more realistic.
The prototype’s existence suggests China may advance faster in semiconductor technology, despite relying on older ASML components.